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Journal Articles

Einstein-de Haas nanorotor

Izumida, Wataru*; Okuyama, Rin*; Sato, Kentaro*; Kato, Takeo*; Matsuo, Mamoru

Physical Review Letters, 128(1), p.017701_1 - 017701_6, 2022/01

 Times Cited Count:4 Percentile:67.44(Physics, Multidisciplinary)

Journal Articles

Purification of anionic fluorescent probes through precise fraction collection with a two-point detection system using multiple-stacking preparative capillary transient isotachophoresis

Haraga, Tomoko; Tsujimura, Hiroto*; Miyauchi, Saori*; Kamimura, Takuya*; Shibukawa, Masami*; Saito, Shingo*

Electrophoresis, 41(13-14), p.1152 - 1159, 2020/07

 Times Cited Count:6 Percentile:45.07(Biochemical Research Methods)

A novel combination of CE-based separation techniques was used for the precise fractionation of ionic compounds from impurities. The combination of on-capillary concentration and separation using transient isotachophoresis, with multiple injections and a two-point detection system provided higher efficiency, and accuracy at a microliter-scale injection volume, than when CE was individually used for purification. In this paper, we present successful applications of the CE fractionation techniques for the purification of fluorescein, fluorescein-4-isothiocyanate, two fluorescent metal ion probes, and a fluorescein-modified DNA aptamer. The purity of the isolated fluorescent probes ranged from 95 to 99%. The purified probe solutions were practical for use as purified stock solutions. The method developed was useful for the purification of anionic fluorescent reagents to be of ultratrace analytical grade for use with CE-LIF.

Journal Articles

IV. Electrochemical measurements in various environments; Nuclear power plant I (Electrochemical measurement in nuclear power plant)

Ueno, Fumiyoshi

Zairyo To Kankyo, 68(1), p.2 - 8, 2019/01

It is important to control the cooling water of light water reactors (boiling water reactor and pressurized water reactor) to suitable quality in order to reduce corrosion of structural materials and generation of radioactive corrosion products. For that purpose, monitoring of water quality using electrochemical measurement method is necessary. In this article, the application of ECP measurement to BWR is mainly focused, I describe the water quality of light water reactors and the necessity of electrochemical measurement.

Journal Articles

Current status of pulsed spallation neutron source of J-PARC

Takada, Hiroshi

JAEA-Conf 2017-001, p.51 - 56, 2018/01

A pulsed spallation neutron source of Japan Proton Accelerator Research Complex (J-PARC) is aimed at promoting a variety of cutting-edge materials researches at state-of-the-art neutron instruments with neutrons generated by a 3-GeV proton beam with a power of 1-MW at a repetition rate of 25 Hz. In 2015, for the first time it received 1-MW equivalent proton beam pulse, and the beam power for user program was ramped up to 500 kW. The moderator system of the neutron source was optimized to use (1) 100% para-hydrogen for increasing pulse peak intensity with decreasing pulse tail, (2) cylindrical shape with 14 cm diam. $$times$$ 12 cm long for providing high intensity neutrons to wide neutron extraction angles of 50.8 degrees, (3) neutron absorber made from Ag-In-Cd alloy to make pulse widths narrower and pulse tails lower. As a result, it gives highest intensity pulsed neutrons per incident proton in the world. Towards the goal to achieve the target operation at 1-MW for 5000 h in a year, efforts to mitigate cavitation damages at the target vessel front with injecting gas micro-bubbles into the mercury target are under way. Also, improvement of structural target vessel design is an urgent issue since there was failure twice at the water shroud of the mercury target due to the thermal stress during operating periods at 500 kW in 2015.

Journal Articles

Size and dopant-concentration dependence of photoluminescence properties of ion-implanted phosphorus- and boron-codoped Si nanocrystals

Nakamura, Toshihiro*; Adachi, Sadao*; Fujii, Minoru*; Sugimoto, Hiroshi*; Miura, Kenta*; Yamamoto, Shunya

Physical Review B, 91(16), p.165424_1 - 165424_8, 2015/04

 Times Cited Count:16 Percentile:56.51(Materials Science, Multidisciplinary)

Semiconductor nanocrystals have unique electrical and optical properties, because of the quantum confinement effect, and the doping of impurities into nanocrystals. In this study, we investigated the photoluminescence (PL) properties of phosphorus- (P) and boron- (B) co-doped Si nanocrystals (Si NCs), which was synthesized using an ion implantation technique. The Si-NC size (average diameter: 3.5, 4.4, 5.2 nm) and the P and B ion doses (0.1-4.5$$times$$10$$^{16}$$ cm$$^{-2}$$)values were systematically varied. We find that the PL peak energy shifts to lower values with increasing the average diameters of Si NCs and PB ion dose. The results of PL measurements indicate that the PL spectra are due to the band-to-band transition at the reduced Si-NC band gap caused by the formation of impurity and the radiative transitions between defect- and/or impurity-related localized states. It was found that the PL properties can be controlled by varying the Si-NC size as well as the dopant concentration.

Journal Articles

Current status of electrostatic accelerators at TIARA

Usui, Aya; Uno, Sadanori; Chiba, Atsuya; Yamada, Keisuke; Yokoyama, Akihito; Kitano, Toshihiko*; Takayama, Terumitsu*; Orimo, Takao*; Kanai, Shinji*; Aoki, Yuki*; et al.

Dai-27-Kai Tandemu Kasokuki Oyobi Sono Shuhen Gijutsu No Kenkyukai Hokokushu, p.118 - 121, 2015/03

no abstracts in English

Journal Articles

Enhanced damage buildup in C$$^{+}$$-implanted GaN film studied by a monoenergetic positron beam

Li, X. F.*; Chen, Z. Q.*; Liu, C.*; Zhang, H.; Kawasuso, Atsuo

Journal of Applied Physics, 117(8), p.085706_1 - 085706_6, 2015/02

 Times Cited Count:23 Percentile:68.13(Physics, Applied)

Vacancy-type defects in C$$^{+}$$-implanted GaN were probed using a slow positron beam. The increase of Doppler broadening S parameter indicates introduction of arge vacancy clusters. Post-implantation annealing at temperatures up to 800$$^{circ}$$C makes these vacancy clusters to agglomerate into microvoids. The vacancy clusters or microvoids show high thermal stability, and they are only partially removed after annealing up to 1000$$^{circ}$$C. Amorphous regions are observed by high resolution transmission electron microscopy measurement, which directly confirms that amorphization is induced by C$$^{+}$$-implantation. The disordered GaN lattice is possibly due to special feature of carbon impurities, which enhance the damage buildup during implantation.

Journal Articles

Production of endohedral $$^{133}$$Xe-higher fullerenes by ion implantation

Watanabe, Satoshi; Katabuchi, Tatsuya*; Ishioka, Noriko; Matsuhashi, Shimpei; Muramatsu, Hisakazu*

Journal of Radioanalytical and Nuclear Chemistry, 272(3), p.467 - 469, 2007/06

 Times Cited Count:1 Percentile:11.32(Chemistry, Analytical)

no abstracts in English

Journal Articles

Effects of a low-energy proton irradiation on n$$^{+}$$/p-AlInGaP solar cells

Lee, H. S.*; Yamaguchi, Masafumi*; Ekins-Daukes, N. J.*; Khan, A.*; Takamoto, Tatsuya*; Imaizumi, Mitsuru*; Oshima, Takeshi; Ito, Hisayoshi

Physica B; Condensed Matter, 376-377, p.564 - 567, 2006/04

 Times Cited Count:2 Percentile:12.58(Physics, Condensed Matter)

no abstracts in English

Journal Articles

Effect of ion species on the production and thermal evolution of implantation induced defects in ZnO

Chen, Z. Q.; Maekawa, Masaki; Kawasuso, Atsuo; Sakai, Seiji; Naramoto, Hiroshi*

JAEA-Review 2005-001, TIARA Annual Report 2004, p.232 - 234, 2006/01

no abstracts in English

Journal Articles

Defect-engineering in SiC by ion implantation and electron irradiation

Pensl, G.*; Ciobanu, F.*; Frank, T.*; Kirmse, D.*; Krieger, M.*; Reshanov, S.*; Schmid, F.*; Weidner, M.*; Oshima, Takeshi; Ito, Hisayoshi; et al.

Microelectronic Engineering, 83(1), p.146 - 149, 2006/01

 Times Cited Count:15 Percentile:59.32(Engineering, Electrical & Electronic)

no abstracts in English

Journal Articles

Hydrogen up-take in noble gas implanted W

Nagata, Shinji*; Yamamoto, Shunya; Tokunaga, Kazutoshi*; Tsuchiya, Bun*; To, Kentaro*; Shikama, Tatsuo*

Nuclear Instruments and Methods in Physics Research B, 242(1-2), p.553 - 556, 2006/01

 Times Cited Count:7 Percentile:47.51(Instruments & Instrumentation)

no abstracts in English

Journal Articles

Interaction of nitrogen with vacancy defects in N$$^{+}$$-implanted ZnO studied using a slow positron beam

Chen, Z. Q.; Maekawa, Masaki; Kawasuso, Atsuo; Suzuki, Ryoichi*; Odaira, Toshiyuki*

Applied Physics Letters, 87(9), p.091910_1 - 091910_3, 2005/08

 Times Cited Count:31 Percentile:71.4(Physics, Applied)

Zinc oxide crystals were implanted with N$$^+$$, O$$^+$$, and co-implanted with O$$^+$$/N$$^+$$ ions. Positron annihilation measurements show the introduction of vacancy clusters upon implantation. In the N$$^+$$-implanted sample, these vacancy clusters are only partially annealed at 800$$^{circ}$$C as compared to their full recovery in the O$$^+$$-implanted sample, suggesting a strong interaction between nitrogen and vacancy clusters. At 1000-1100$$^{circ}$$C, nitrogen also forms stable complexes with thermally generated vacancies. To remove all the detectable vacancy defects, a high temperature annealing at 1250$$^{circ}$$C is needed. Furthermore, Hall measurements of this sample show n-type conductivity though nitrogen is expected as acceptors. On the contrary, in the O$$^+$$/N$$^+$$ co-implanted sample, most vacancy clusters disappear at 800$$^{circ}$$C. Probably oxygen scavenges nitrogen to form N-O complexes and hence enhance the annealing of vacancy clusters. A highly compensated semi-insulating layer is formed in the co-implanted sample.

Journal Articles

Challenge of the development of high performance SiC semiconductor devices

Oshima, Takeshi

Hoshasen To Sangyo, (105), p.12 - 18, 2005/03

no abstracts in English

Journal Articles

Microvoid formation in hydrogen-implanted ZnO probed by a slow positron beam

Chen, Z. Q.; Kawasuso, Atsuo; Xu, Y.; Naramoto, Hiroshi*; Yuan, X. L.*; Sekiguchi, Takashi*; Suzuki, Ryoichi*; Odaira, Toshiyuki*

Physical Review B, 71(11), p.115213_1 - 115213_8, 2005/03

 Times Cited Count:106 Percentile:93.71(Materials Science, Multidisciplinary)

ZnO crystals were implanted with 20-80 keV hydrogen ions up to a total dose of 4.4$$times$$10$$^{15}$$ cm$$^{-2}$$. Positron annihilation measurements show introduction of zinc vacancies, which are filled with hydrogen atoms. After isochronal annealing at 200-500 $$^{circ}$$C, the vacancies agglomerate into hydrogen bubbles. Further annealing at 600-700 $$^{circ}$$C causes release of hydrogen out of the bubbles, leaving large amount of microvoids. These microvoids are annealed out at high temperature of 1000 $$^{circ}$$C. Cathodoluminescence measurements reveal that hydrogen ions also passivate deep level emission centers before their release from the sample, and lead to the improvement of the UV emission.

Journal Articles

B-C-N hybrid synthesis by high-temperature ion implantation

Uddin, M. N.; Shimoyama, Iwao; Baba, Yuji; Sekiguchi, Tetsuhiro; Nath, K. G.; Nagano, Masamitsu*

Applied Surface Science, 241(1-2), p.246 - 249, 2005/01

 Times Cited Count:8 Percentile:37.11(Chemistry, Physical)

Recently, much attention has been given on the synthesis and characterization of graphite-like B-C-N hybrid. Since graphite-like B-C-N hybrid may have semiconducting property, this material is interesting for applications to electronic and luminescent devices. In order to synthesize this material, borazine ion plasma was implanted in graphite at room temperature (RT) and 600 $$^{circ}$$C. An ultrahigh vacuum (UHV) chamber with base pressure $$sim$$10$$^{-7}$$ Pa was used for the experiment. The X-ray photoelectron spectroscopy (XPS) study suggested that B atoms in the deposited films are in a wide variety of atomic environment such as BC3, BN3 and B-C-N hybrid. The ratios of these coordinations strongly depend on the temperature during the ion implantation. It was found that the B-C-N hybrid is predominantly synthesized by the implantation at 600 $$^{circ}$$C where the surface [B]/([B]+[C]+[N]) ratio ranges from 0.1 to 0.35. The results imply that it is possible to control the composition of B-C-N hybrid by changing the fluence of the ion plasma and the temperature of graphite during ion implantation.

Journal Articles

Production and recovery of defects in phosphorus-implanted ZnO

Chen, Z. Q.; Kawasuso, Atsuo; Xu, Y.; Naramoto, Hiroshi; Yuan, X. L.*; Sekiguchi, Takashi*; Suzuki, Ryoichi*; Odaira, Toshiyuki*

Journal of Applied Physics, 97(1), p.013528_1 - 013528_6, 2005/01

 Times Cited Count:147 Percentile:96.39(Physics, Applied)

Phosphorus ions were implanted into ZnO crystals with energies of 50-380 keV to a dose of 10$$^{13}$$-10$$^{15}$$ cm$$^{-2}$$. Positron annihilation measurements show the introduction of vacancy clusters after implantation. These vacancy clusters evolve to microvoids after annealing at a temperature of 600$$^{circ}$$C, and disappear gradually up to 1100$$^{circ}$$C. Raman scattering measurements show the production of oxygen vacancies (V$$_{O}$$). They are annealed up to 700$$^{circ}$$C accompanying the agglomeration of vacancy clusters. The light emissions of ZnO are suppressed due to the competing nonradiative recombination centers introduced by implantation. Recovery of the light emission occurs above 600$$^{circ}$$C. The vacancy-type defects detected by positrons might be part of the nonradiative recombination centers. Hall measurement shows n-type conductivity for the P$$^+$$-implanted ZnO layer, which suggests that phosphorus is an amphoteric dopant.

Journal Articles

Evaluation of the electrical characteristics of III-V compounds solar cells irradiated with protons at low temperature

Oshima, Takeshi; Sumita, Taishi*; Imaizumi, Mitsuru*; Kawakita, Shiro*; Shimazaki, Kazunori*; Kuwajima, Saburo*; Oi, Akihiko*; Ito, Hisayoshi

Proceedings of 31st IEEE Photovoltaic Specialists Conference and Exhibition (PVSC-31), p.806 - 809, 2005/00

no abstracts in English

Journal Articles

Hydrogen bubble formation in H-implanted ZnO studied using a slow positron beam

Chen, Z. Q.; Maekawa, Masaki; Kawasuso, Atsuo; Yamamoto, Shunya; Yuan, X. L.*; Sekiguchi, Takashi*; Suzuki, Ryoichi*; Odaira, Toshiyuki*

JAERI-Review 2004-025, TIARA Annual Report 2003, p.193 - 195, 2004/11

20-80 keV hydrogen ions were implanted into ZnO single crystals up to a total dose of 4.4$$times$$10$$^{15}$$ cm$$^{-2}$$. Positron annihilation measurements using a slow positron beam revealed introduction of vacancies after implantation, which are filled with hydrogen impurities. After annealing, these hydrogen filled vacancies grow into large hydrogen bubbles. At annealing temperature of 500-700$$^{circ}$$C, these hydrogen impurities are released from the bubbles, and remain open microvoids. These microvoids are finally annealed out at about 1100$$^{circ}$$C. The effects of hydrogen implantation on the light luminescence in ZnO will also be discussed.

Journal Articles

Nitriding transformation of titanium thin films by nitrogen implantation

Kasukabe, Yoshitaka*; Wang, J. J.*; Yamamura, Tsutomu*; Yamamoto, Shunya; Fujino, Yutaka*

Thin Solid Films, 464-465, p.180 - 184, 2004/10

 Times Cited Count:9 Percentile:43.98(Materials Science, Multidisciplinary)

no abstracts in English

169 (Records 1-20 displayed on this page)